Cloud native EDA tools & pre-optimized hardware platforms
Powerful numerical algorithms simulate process steps like implantation, diffusion and dopant activation, etching, deposition, oxidation, and epitaxial growth in different semiconductor materials. Process conditions such as the ambient chemical composition, temperature, and pressure during individual fabrication steps are typical inputs. The final output is a 2D or 3D device structure which can be used for device simulation.
Synopsys has four process simulation tools: Sentaurus Process, Taurus TSUPREM-4, Sentaurus Topography 3D, and Sentaurus Lithography.