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Computational Lithography 91³Ô¹ÏÍø to Enable High NA EUV

This white paper identifies and discusses the computational needs required to support the development, optimization, and implementation of High NA Extreme Ultraviolet (EUV) Lithography. It explores the challenges associated with the increased complexity of High NA systems, proposes potential solutions, and highlights the importance of computational lithography in driving the success of advanced EUV lithography technologies.

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